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Статьи в журналах
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- 2014 Improved Plasma Resistance for Porous Low-k Dielectrics by Pore Stuffing Approach
- Liping Zhang, de Marneffe Jean-Francois, Heyne Markus H., Sergej Naumov, Yiting Sun, Alexey Zotovich, Otell Ziad el, Felim Vajda, Stefan De Gendt, Baklanov Mikhail R.
- в журнале ECS Journal of Solid State Science and Technology, издательство Electrochemical Society, Inc. (United States), том 4, № 1, с. 3098-3107 DOI
Доклады на научных конференциях
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- 2016 Ultra low-k etching by neutral beams produced from CF4/Ar and SF6/Ar ICP plasmas (Стендовый)
- Авторы: Alexey Zotovich, Otell Ziad el, Yvonne Sutton, Braithwaite N.St J, de Marneffe Jean-Francois, Mikhail Baklanov
- PESM 2016, Франция, 9-10 мая 2016
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- 2015 Comparison between Vacuum Ultra-Violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching (Стендовый)
- Авторы: Zotovich Alexey I., Otell Ziad el, de Marneffe Jean-Francois, Proshina Olga V., Lopaev Dmitry V., Rakhimova Tatyana V., Baklanov Mikhail R.
- PESM 2015, Leuven, Бельгия, 27-28 апреля 2015