Baklanov M.R.
Количество цитирований статей в журналах по данным
Web of Science: 279,
Scopus: 318
IstinaResearcherID (IRID): 2467527
Деятельность
-
Статьи в журналах
-
-
2022
Effect of H atoms and UV wideband radiation on cured low-k OSG films
-
Lopaev Dmitry,
Zotovich Alexey,
Zyryanov S.M.,
Bogdanova Maria,
Rakhimova T.V.,
Mankelevich Yu A.,
Novikova N.N.,
Seregin Dmitry S.,
Vishnevskiy Alexey,
Vorotilov Konstantin,
Shi Xiaoping,
Baklanov Mikhail
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 55, № 25, с. 255206
DOI
-
-
2022
Modification of Porous Ultralow-k Film by Vacuum Ultraviolet Emission
-
Zotovich Alexey I.,
Zyryanov Sergey M.,
Lopaev Dmitry V.,
Rezvanov Askar A.,
Attallah Ahmed G.,
Liedke Maciej O.,
Butterling Maik,
Bogdanova Maria A.,
Vishnevskiy Alexey S.,
Seregin Dmitry S.,
Vorotyntsev Dmitry A.,
Palov Alexander P.,
Hirschmann Eric,
Wagner Andreas,
Naumov Sergej,
Vorotilov Konstantin A.,
Rakhimova Tatyana V.,
Rakhimov Alexander T.,
Baklanov Mikhail R.
-
в журнале ACS Applied Electronic Materials, издательство American Chemical Society (United States), том 4, № 6, с. 2760-2776
DOI
-
-
2021
Charge Transport Mechanism and Trap Origin in Methyl-Terminated Organosilicate Glass Low-κ Dielectrics
-
Perevalov T.V.,
Gismatulin A.A.,
Dolbak A.E.,
Gritsenko V.A.,
Trofimova E.S.,
Pustovarov V.A.,
Seregin D.S.,
Vorotilov K.A.,
Baklanov M.R.
-
в журнале Physica Status Solidi (A) Applications and Materials Science, издательство Wiley - V C H Verlag GmbbH & Co. (Germany), том 218, № 4
DOI
-
-
2020
Evaluation of Mechanical Properties of Porous OSG Films by PFQNM AFM and Benchmarking with Traditional Instrumentation
-
Ovchinnikov I.S.,
Vishnevskiy A.S.,
Seregin D.S.,
Rezvanov A.A.,
Schneider D.,
Sigov A.S.,
Vorotilov K.A.,
Baklanov M.R.
-
в журнале Langmuir, издательство American Chemical Society (United States), том 36, № 32, с. 9377-9387
DOI
-
-
2020
VUV radiation flux from argon DC magnetron plasma
-
Pal Alexander Fridrikhovich,
Ryabinkin Alexey Nikolaevich,
Serov Alexander Olegovich,
Lopaev Dmitry,
Mankelevich Yu A.,
Rakhimov A.T.,
Rakhimova T.V.,
Baklanov Mikhail
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 53, № 29, с. 295202
DOI
-
-
2019
Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: General behavior, practical applications, and atomic models
-
Baklanov M.R.,
Jousseaume V.,
Rakhimova T.V.,
Lopaev D.V.,
Mankelevich Yu A.,
Afanas'ev V.V.,
Shohet J.L.,
King S.W.,
Ryan E.T.
-
в журнале APPLIED PHYSICS REVIEWS, том 6, № 1, с. 011301
DOI
-
-
2018
A non-destructive, fast evaluation of PVD diffusion barriers deposited on porous low-k dielectrics
-
Yingjie Wang,
Peng He,
Jing Zhang,
Jiang Yan,
Lopaev D.V.,
Xin-Ping Qu,
Baklanov M.R.
-
в журнале Microelectronic Engineering, издательство Elsevier BV (Netherlands), том 198, с. 22
DOI
-
-
2018
Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV
-
Lopaev D.V.,
Rakhimova T.V.,
Rakhimov A.T.,
Zotovich A.I.,
Zyryanov S.M.,
Baklanov M.R.
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 51, № 2, с. 02LT02
DOI
-
-
-
-
2017
Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures
-
Lopaev D.,
Mankelevich Yu A.,
Rakhimova T.V.,
Zotovich Alexey,
Zyryanov S.M.,
Baklanov Mikhail R.
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 50, с. 485202
DOI
-
-
2017
Experimental and DFT study of nitrogen atoms interactions with SiOCH low-k films
-
Voronina E.N.,
Mankelevich Yu A.,
Rakhimova T.V.,
Palov A.P.,
Lopaev D.V.,
Zyryanov S.M.,
Zotovich A.I.,
Baklanov M.R.
-
в журнале European Physical Journal D, издательство Springer Verlag (Germany), том 71, с. 111
DOI
-
-
2017
Fluorine atoms interaction with the nanoporous materials: experiment and DFT simulation
-
Mankelevich Yu A.,
Voronina E.N.,
Rakhimova T.V.,
Palov A.P.,
Lopaev D.V.,
Zyryanov S.M.,
Baklanov M.R.
-
в журнале European Physical Journal D, издательство Springer Verlag (Germany), том 71, № 5, с. 126
DOI
-
-
-
2016
Comparison of vacuum ultra-violet emission of Ar/CF4and Ar/CF3I capacitively coupled plasmas
-
Zotovich A.,
Proshina O.,
el Otell Z.,
Lopaev D.,
Rakhimova T.,
Rakhimov A.,
de Marneffe J.F.,
Baklanov M.R.
-
в журнале Plasma Sources Science and Technology, издательство IOP Publishing ([Bristol, UK], England), том 25, № 5, с. 055001
DOI
-
-
2016
Multi-step reactions mechanism for F atoms interactions with organosilicate glass and SiOx films
-
Mankelevich Yu A.,
Voronina E.N.,
Rakhimova T.V.,
Palov A.P.,
Lopaev D.V.,
Zyryanov S.M.,
Baklanov M.R.
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 49, № 34, с. 345203
DOI
-
-
-
2015
Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures
-
Proshina O.V.,
Rakhimova T.V.,
Lopaev D.V.,
Samara V.,
Baklanov M.R.,
de Marneffe J-F
-
в журнале Plasma Sources Science and Technology, издательство IOP Publishing ([Bristol, UK], England), том 24, с. 055006
DOI
-
-
2015
Interaction of F atoms with SiOCH ultra low-k films Part II: etching
-
Rakhimova T.V.,
Lopaev D.V.,
Mankelevich Y.A.,
Kurchikov K.A.,
Zyryanov S.M.,
Palov A.P.,
Proshina O.V.,
Maslakov K.I.,
Baklanov M.R.
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 48, № 17, с. 175204-(14pp)
DOI
-
-
2015
Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials
-
el Otell Z.,
Šamara V.,
Zotovich A.,
Hansen T.,
de Marneffe J.F.,
Baklanov M.R.
-
в журнале Journal of Physics D - Applied Physics, издательство IOP Publishing ([Bristol, UK], England), том 48, № 39, с. 395202
DOI
-
-
2014
Improved Plasma Resistance for Porous Low-k Dielectrics by Pore Stuffing Approach
-
Liping Zhang,
de Marneffe Jean-Francois,
Heyne Markus H.,
Sergej Naumov,
Yiting Sun,
Alexey Zotovich,
Otell Ziad el,
Felim Vajda,
Stefan De Gendt,
Baklanov Mikhail R.
-
в журнале ECS Journal of Solid State Science and Technology, издательство Electrochemical Society, Inc. (United States), том 4, № 1, с. 3098-3107
DOI
-
-
2013
Modification of organosilicate glasses low-k films under extreme and vacuum ultraviolet radiation
-
Rakhimova T.V.,
Rakhimov A.T.,
Mankelevich Yu A.,
Lopaev D.V.,
Kovalev A.S.,
Vasil’eva A.N.,
Proshina O.V.,
Braginsky O.V.,
Zyryanov S.M.,
Kurchikov K.,
Novikova N.N.,
Baklanov M.R.
-
в журнале Applied Physics Letters, издательство AIP Publishing (United States), том 102, № 11, с. 111902
DOI
-
-
2013
Plasma processing of low-k dielectrics
-
Baklanov Mikhail R.,
de Marneffe Jean-Francois,
Shamiryan Denis,
Urbanowicz Adam M.,
Shi Hualiang,
Rakhimova Tatyana V.,
Huang Huai,
Ho Paul S.
-
в журнале Journal of Applied Physics, издательство AIP Publishing (United States), том 113, № 4
DOI
-
-
2012
Ultra low-k dielectrics damage under VUV and EUV radiation
-
Sergey Zyryanov,
Oleg Braginsky,
Alexander Kovalev,
Dmitry Lopaev,
Yury Mankelevich,
Tatyana Rakhimova,
Alexander Rakhimov,
Anna Vasilieva,
Mikhail Baklanov
-
в журнале Bulletin of the American Physical Society, 65th Annual Gaseous Electronics Conference, том 57, № 8
-
-
2011
The Effect of He Plasma Treatment on Properties of Organosilicate Glass Low-K Films
-
Braginsky O.V.,
Kovalev A.S.,
Lopaev D.V.,
Malykhin E.M.,
Mankelevich Yu A.,
Proshina O.V.,
Rakhimova T.V.,
Rakhimov A.T.,
Voloshin D.G.,
Vasilieva A.N.,
Zyryanov S.M.,
Smirnov E.A.,
Baklanov M.R.
-
в журнале Journal of Applied Physics, издательство AIP Publishing (United States), том 109, № 4, с. 043303
DOI
-
-
2010
The Mechanism of Low-K SiOCH Film Modification by Oxygen Atoms
-
Braginsky O.V.,
Kovalev A.S.,
Lopaev D.V.,
Malykhin E.M.,
Mankelevich Yu A.,
Rakhimova T.V.,
Rakhimov A.T.,
Vasilieva A.N.,
Zyryanov S.M.,
Baklanov M.R.
-
в журнале Journal of Applied Physics, издательство AIP Publishing (United States), том 108, № 7, с. 073303
DOI
-
-
2009
The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials
-
Braginsky O.V.,
Kovalev A.S.,
Lopaev D.V.,
Malykhin E.M.,
Mankelevich Yu A.,
Rakhimova T.V.,
Rakhimov A.T.,
Vasilieva A.N.,
Zyryanov S.M.,
Baklanov M.R.
-
в журнале Bulletin of the American Physical Society, 62nd Annual Gaseous Electronics Conference, том 54, № 12
-
Статьи в сборниках
-
-
-
2013
Effects of VUV and EUV Radiation on Ultra Low-k Materials Damage
-
Oleg Braginsky,
Alexander Kovalev,
Dmitry Lopaev,
Yury Mankelevich,
Olga Proshina,
Tatyana Rakhimova,
Alexander Rakhimov,
Anna Vasilieva,
Sergey Zyryanov,
Mikhail Baklanov
-
в сборнике MRS Online Proceedings Library, издательство Cambridge University Press (United Kingdom), том 1559, с. mrss13-1559-aa03-11
DOI
-
-
2009
Interaction of О and Н Atoms with Low-K SiOCH Films Pretreated in He Plasma
-
Braginsky O.V.,
Kovalev A.S.,
Lopaev D.V.,
Mankelevich Y.A.,
Malykhin E.M.,
Proshina O.V.,
Rakhimova T.V.,
Rakhimov A.T.,
Vasilieva A.N.,
Voloshin D.G.,
Zyryanov S.M.,
Baklanov M.R.
-
в сборнике Materials Research Society Symposium Proceedings, место издания Materials Research Society, том 1156
DOI
-
-
2008
Recombination Probabilities of О and Н Atoms on the Surface of Nanoporous Low-K SiOCH Dielectrics
-
Braginsky O.V.,
Kovalev A.S.,
Lopaev D.V.,
Malykhin E.M.,
Mankelevich Yu A.,
Rakhimova T.V.,
Rakhimov A.T.,
Vasilieva A.N.,
Zyryanov S.M.,
Baklanov M.R.
-
в сборнике Proceedings of Advanced Metallization Conference (AMC), September 23-25 2008, San Diego California, USA, and October 8-10 2008, Tokyo, Japan, место издания San Diego California, USA, and Tokyo, Japan
-
Доклады на конференциях
-
-
-
-
2016
Experimental and ab initio study of nitrogen atoms interaction with SiOCH low-k films
(Стендовый)
-
Авторы:
Mankelevich Yu A.,
Voronina E.N.,
Rakhimova T.V.,
Baklanov M.R.,
Lopaev D.V.,
Zyryanov S.M.,
Zotovich A.I.,
Palov A.P.
-
International Conference on Many Particle Spectroscopy of Atoms, Molecules, Clusters and Surfaces (MPS2016), Москва, Россия, 23-26 августа 2016
-
-
2016
Fluorine atoms interaction with the nanoporous materials: Experiment and ab initio simulation
(Устный)
-
Авторы:
Mankelevich Yu A.,
Voronina E.N.,
Rakhimova T.V.,
Baklanov M.R.,
Lopaev D.V.,
Zyryanov S.M.,
Palov A.P.
-
International Conference on Many Particle Spectroscopy of Atoms, Molecules, Clusters and Surfaces (MPS2016), Москва, Россия, 23-26 августа 2016
-
-
-
2015
Interaction of atomic fluorine with porous low-k SiOCH films: modeling
(Стендовый)
-
Авторы:
Palov A.,
Voronina E.,
Lopaev D.,
Mankelevich Yu,
Rakhimova T.,
Zyryanov S.,
Proshina O.,
Baklanov M.
-
ISPC 2015 22nd International Symposium on Plasma Chemistry, Антверпен, Бельгия, 5-10 июля 2015
-
-
2015
Low-k OSG damage and etching by F atoms at lowered temperatures
(Стендовый)
-
Авторы:
Zyryanov S.,
Kurchikov K.,
Lopaev D.,
Mankelevich Yu,
Palov A.,
Rakhimova T.,
Voronina E.,
Novikova N.,
Baklanov M.
-
ISPC 2015 22nd International Symposium on Plasma Chemistry, Антверпен, Бельгия, 5-10 июля 2015
-
-
-
-
-
-
-
2013
1D model of OSG low-k films modification by EUV/VUV emission
(Устный)
-
Авторы:
Rakhimov A.T.,
Mankelevich Yu A.,
Rakhimova T.V.,
Lopaev D.V.,
Zyryanov S.M.,
Baklanov M.R.,
Vasil'eva A.N.,
Proshina O.V.,
Braginsky O.V.,
Kurchikov K.,
Kovalev A.S.
-
PESM 2013 (14 - 15 March 2013, Leuven Belgium), Лёвен, Бельгия, 14-15 марта 2013