Russian Microelectronicsжурнал

Статьи, опубликованные в журнале

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  • 2022 Analysis of hydrodynamics in the synthesis of crystals from water-salt solutions
  • Prostomolotov A.I., Verezub N.A.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 51, № 8, с. 662-666 DOI
• • 2022 On the Mechanisms Regulating the Plasma Composition and Kinetics of Heterogeneous Processes in a CF4 + CHF3 + Ar Mixture
  • Efremov A.M., Betelin V.B., Kwon K.H.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 51, № 5, с. 302-310 DOI
• • 2022 Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C6F12O + Ar Mixture
  • Efremov A.M., Betelin V.B., Kwon K.H.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 51, № 4, с. 247-254 DOI
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  • 2022 Technology and thermomechanics in growing tubular silicon single crystal
  • Verezub N.A., Kozhitov L.V., Kondratenko T.T., Prostomolotov A.I., Silaev I.V.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 51, № 8, с. 677-685 DOI
• • 2022 The study of nickel impurity segregation on LSNT perovskite open surfaces by ab initio molecular dynamics
  • Chistyakova A.A., Bazhanov D.I.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 51, № 8, с. 1-5 DOI
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  • 2021 Application of the Spectral Ellipsometry Method to Study the Processes of Atomic Layer Deposition
  • Miakonkikh A.V., Smirnova E.A., Clemente I.E.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 4, с. 230-238 DOI
• • 2021 Experimental Study of the Influence of the Porosity of Thin-Film Silicon-Based Anodes on Their Charge-Discharge Characteristics
  • Kulova T.L., Mazaletsky L.A., Mironenko A.A., Rudy A.S., Skundin A.M., Tortseva Yu S., Fedorov I.S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 1, с. 44-52 DOI
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  • 2021 Mechanisms of Plasma Etching of Titanium, Indium, Tin, and Zinc Oxides in a Mixture of HBr + Ar
  • Efremov A.M., Smirnov S.A., Betelin V.B., Kwon K.H.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 6, с. 379-386 DOI
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  • 2021 Numerical Simulation of Cryogenic Etching: Model with Delayed Desorption
  • Rudenko M.K., Myakon’kikh A.V., Lukichev V.F.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 1, с. 54-62 DOI
• • 2021 Specific Features of the Kinetics of the Reactive-Ion Etching of Si and SiO2 in a CF4 + O2 Mixture in a Low Power Supply Mode
  • Efremov A.M., Betelin V.B., Kwon K.H.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 5, с. 303-310 DOI
• • 2021 Study of Spin-Tunnel Junction Magnetization Using Coherent Rotation of the Free Layer Magnetization Model
  • Amelichev V.V., Vasiliev D.V., Kostyuka Yu V Kazakov D.V., Kasatkin S.I., Polyakov O.P., Polyakov P.A., Shevtsov V.S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 6, с. 461-466 DOI
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  • 2021 Study of the Plasma Resistance of a High Resolution e-Beam Resist HSQ for Prototyping Nanoelectronic Devices
  • Miakonkikh A.V., Shishlyannikov A.V., Tatarintsev A.A., Kuzmenko V.O., Rudenko K.V., Gornev E.S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 5, с. 297-302 DOI
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  • 2021 Thin-Film Solid State Lithium-Ion Batteries of the LiCoO2/Lipon/Si@O@Al System
  • Rudy A.S., Mironenko A.A., Naumov V.V., Fedorov I.S., Skundin A.M., Tortseva Yu S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 50, № 5, с. 333-338 DOI
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  • 2020 Amorphization of Vanadium Oxides during the Reversible Insertion of Lithium
  • Skundin A.M., Mironenko A.A., Rudyi A.S., Fedorov I.S., Vasiliev S.V., Mazaletsky L.A., Tortseva Yu S., Kuznetsov O.E.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 49, № 6, с. 416-422 DOI
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  • 2020 The Effect of Temperature on the Development of a Contrast HSQ Electronic Resist
  • Tatarintsev A.A., Shishlyannikov A.V., Rudenko K.V., Rogozhin A.E., Ieshkin A.E.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 49, № 3, с. 151-156 DOI
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  • 2020 The Effect of Temperature on the Development of a Contrast HSQ Electronic Resist
  • Tatarintsev A.A., Shishlyannikov A.V., Rudenko K.V., Rogozhin A.E., Ieshkin A.E.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 49, № 3, с. 151-156 DOI
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  • 2019 Layout Synthesis Design Flow for Special-Purpose Reconfigurable Systems-on-a-Chip
  • Gavrilov S.V., Zheleznikov D.A., Zapletina M.A., Khvatov V.M., Chochaev R.Z., Enns V.I.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 48, № 3, с. 176-186
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  • 2019 Methods and Algorithms for the Logical-Topological Design of Microelectronic Circuits at the Valve and Inter-Valve Levels for Promising Technologies with a Vertical Transistor Gate
  • Ivanova G.A., Ryzhova D.I., Gavrilov S.V., Vasilyev N.O., Stempkovskii A.L.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 48, № 3, с. 167-175
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  • 2019 Methods and Algorithms for the Logical-Topological Design of Microelectronic Circuits at the Valve and Inter-Valve Levels for Promising Technologies with a Vertical Transistor Gate
  • Ivanova G.A., Ryzhova D.I., Gavrilov S.V., Vasilyev N.O., Stempkovskii A.L.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 48, № 3, с. 167-175 DOI
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  • 2019 Synthesis of a Functional Control Circuit Based on the Spectral R-Code with the Partitioning of Outputs into Groups
  • Stempkovskii A.L., Tel’pukhov D.V., Zhukova T.D., Demeneva A.I., Nadolenko V.V., Gurov S.I.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 48, № 4, с. 240-249 DOI
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  • 2018 A Thin-Film Platform for Chemical Gas Sensors
  • Roslyakov I.V., Napolskii K.S., Stolyarov V.S., Karpov E.E., Ivashev A.V., Surtaev V.N.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 47, № 4, с. 226-233 DOI
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  • 2018 Dependence of the Resistance of the Negative e-Beam Resist HSQ Versus the Dose in the RIE and Wet Etching Processes
  • Miakonkikh A.V., Orlikovskiy N.A., Rogozhin A.E., Tatarintsev A.A., Rudenko K.V.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 47, № 3, с. 157-19 DOI
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  • 2018 Investigation of the Process of Open Plasma-Chemical Etching of HkMG Stack Nanoscale Transistor with a 32-nm Critical Dimension
  • Myakonkikh A.V., Kuvaev K.Yu, Tatarintsev A.A., Orlikovskii N.A., Rudenko K.V., Guschin O.P., Gornev E.S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 47, № 5, с. 325-333 DOI
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  • 2018 Magnetic force microscopy of iron and nickel nanowires fabricated by the matrix synthesis technique
  • Bizyaev D.A., Bukharaev A.A., Khaibullin R.I., Lyadova N.M., Zagorskii D.L., Bedin S.A., Doludenko I.M.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 47, № 3, с. 187-196 DOI
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  • 2018 Modeling the Dynamics of the Integral Dielectric Permittivity of a Porous Low-K Organosilicate Film during the Dry Etching of a Photoresist in O2 Plasma
  • Rezvanov A.A., Matyushkin I.V., Gushchin O.P., Gornev E.S.
  • в журнале Russian Microelectronics, издательство Maik Nauka/Interperiodica Publishing (Russian Federation), том 47, № 6, с. 415-426 DOI