ИСТИНА

Sub-Wavelength Holographic Lithography (SWHL) is an unorthodox approach to microprinting using computer generated holograms serving both as mask and projection lens. In contrast to the conven-tional projection lithography SWHL utilizes wave diffraction effects on mask elements instead sup-pressing them. The SWHL is capable of dramatic reduction of the lithography cost and opens new opportunities in 3D imaging. Two proof-of-concept exposure systems were designed and built to verify the SWHL capabilities: the first for imaging patterns with sub-wavelength resolution, the second for printing on 3D surfaces. The fidelity and computation efficiency of mask synthesis and RET algorithms were verified.