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Интеллектуальная Система Тематического Исследования НАукометрических данных |
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We propose a 3D model of atomic fluorine interaction with porous low-k SiOCH films. Some possible chemical reactions of fluorine with methyl groups on pore surfaces and SiO2 surface were investigated on the level of density functional theory and implemented in the model. The developed model was finally used to predict the fluorine distribution inside films after its deposition.