Effect of reactive oxygen species generated with ultraviolet lamp and plasma on polyimide surface modification

Kondo, T.; Watanabe, R.; Shimoyama, Y.; Shinohe, K.; Kulinich, S.A.; Iwamori, S.

Авторы: Kondo T., Watanabe R., Shimoyama Y., Shinohe K., Kulinich S.A., Iwamori S.
Журнал: Surface and Interface Analysis
Том: 49
Номер: 11
Год издания: 2017
Издательство: John Wiley & Sons Inc.
Местоположение издательства: United States
Первая страница: 1069
Последняя страница: 1077
DOI: 10.1002/sia.6279
Аннотация: Understanding the effect of reactive oxygen species (ROS), such as singlet oxygen molecule and atomic oxygen, on polyimide (PI) film properties, such as wettability, morphology, and chemical bonding state, is essential for further development of PI‐based surfaces. We investigated the effect of different ROS generated during ultraviolet (UV) and plasma treatment in oxygen gas on surface modification of Kapton PI. Different surface modification techniques, UV and plasma treatment, are known to generate different ROS. In this work, we demonstrate the effect of different ROS on PI surface modification. From the diagnostics of ROS by means of electron spin resonance and optical emission spectroscopy, we confirmed that during UV treatment, excited singlet oxygen molecules are the main ROS, while plasma treatment mainly generated atomic oxygen. The wettability of PI surface treated by UV and plasma resulted in hydrophilic PI surfaces. XPS results show that the wettability of PI samples is mainly determined by their surface O/C ratio. However, chemical bonding states were different: while UV treatment tended to generate C=O bonds, while plasma treatment tended to generate both C―O and C=O bonds. Singlet oxygen molecules are concluded to be the main oxidant during UV treatment, and their main reaction with PI was concluded to be of the addition type, leading to an increase of C=O groups on the surface of PI film. Meanwhile, atomic oxygen species were the main oxidant during plasma treatment, reacting with the PI surface through both etching and addition reaction, resulting in a wider variety of bonds, including both C―O and C=O groups.
Добавил в систему: Кулинич Сергей Алексеевич

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