In-situ resist colloidal lithography for affordable plasmonicsстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 26 декабря 2017 г.
Аннотация: A recently developed extension of Sparse Colloidal Lithography, an In-situ Resist Colloidal Lithography method is presented. The technique is based on in-situ deposition of structured resist layer having low adhesion to target material to form nanoparticles of desired shape. A high potential of the method is demonstrated by the examples of fabricated plasmonic nanostructures with different shapes, including concentric and non-concentric rings, disks and chiral comma-like particles.