Tin trifluoroacetylacetonate [Sn(C5H4O2F3)2] as a precursor of tin dioxide in APCVD processстатья

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[1] Tin trifluoroacetylacetonate [sn(c5h4o2f3)2] as a precursor of tin dioxide in apcvd process / V. S. Popov, P. A. Ignatov, A. V. Churakov et al. // Russian Journal of Inorganic Chemistry. — 2016. — Vol. 61, no. 5. — P. 545–553. A new method of synthesis of volatile complex, tin trifluoroacetylacetonate [Sn(C5H4O2F3)2], was proposed. The prepared compound was identified by IR spectroscopy, CH analysis, X-ray powder diffraction, and DTA/TGA, the composition was confirmed by MALDI-TOF mass spectrometry, crystal structure was established. Thin films of tin dioxide on silicon were obtained by atmospheric pressure chemical vapor deposition using [Sn(C5H4O2F3)2] as a precursor. The morphology and composition of the films were studied by scanning electron microscopy, EDX elemental analysis, and X-ray powder diffraction. Surface resistance and light transmission in visible and near IR region were studied. © 2016, Pleiades Publishing, Ltd. [ DOI ]

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