Аннотация:Direct parallel writing nano-patterns over a large surface area is a challenging task. Techniques like electron beam and focused ion beam lithography are limited to particular applications because of low throughput and expensive setup. In this paper, an efficient and low-cost technique is reported on direct laser surface nanopatterning in the near-field region. By using angular incident laser beams with a self-assembled particle-lens array, flexible patterns have been produced by a few laser pulse exposures. It was demonstrated that hundred million parallel features can be written simultaneously in an area of one centimeter square.