Modeling of dielectric polarization during an electron beam exposure

Авторы: Borisov S.S., Grachev E.A., Zaitsev S.I., Negulyaev N.N., Cheremukhin E.A.
Сборник: Proceedings of SPIE - The International Society for Optical Engineering
Год издания: 2004
Первая страница: 186
Последняя страница: 193
DOI: 10.1117/12.552222
Аннотация: From Conference Volume 5398 Sixth Seminar on Problems of Theoretical and Applied Electron and Ion Optics Anatoly M. Filachev March 01, 2004 Abstract On the basis of Monte-Carlo method a new approach to modeling of an electron interaction with a substance is offered. Some phenomena concerned with spatial energy distribution and accumulation of a charge in an irradiated sample are considered. Calculations of distributions of electric potential and resists polarization induced by an injected charge are presented. It is shown that charging is still the essential circumstance, capable to cause significant loss of accuracy in electron-beam lithography. © (2004) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only. Topics Dielectric polarization ; Electron beams ; Electrons ; Lithography ; Modeling ; Polarization
Добавил в систему: Грачев Евгений Александрович

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