Growth of single-crystal diamonds in microwave plasmaстатья
Информация о цитировании статьи получена из
Scopus,
Web of Science
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 5 сентября 2016 г.
Аннотация:A microwave plasma (2.45 GHz) was used for depositing single crystal diamond layers at the deposition rate up to 40 mu m/h in hydrogen-methane mixtures on the substrates from natural and synthetic diamond with the (100) deposition surface and with the size up to 5 x 5 mm. The structure and the defect-impurity composition of the fabricated single crystals with the thickness up to 600 mu m have been investigated using Raman spectroscopy, photoluminescence spectroscopy, cathode luminescence spectroscopy, and electron and optical microscopy. A high quality and purity of the diamond layers deposited from a plasma was confirmed.