Tantalum chemical vapour deposition on steel and tungsten substrates in the TaBr5-Cd-He systemстатьяИсследовательская статья
Статья опубликована в высокорейтинговом журнале
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Дата последнего поиска статьи во внешних источниках: 24 января 2020 г.
Аннотация:The composition of coating layers deposited on the surface of 12Kh18N10T stainless steel (similar to 321 AISI) in the TaBr5-Cd-He system at temperatures ranging from 623 К to 1423 К and at a pressure of 1 atm was evaluated using thermodynamic analysis. Tantalum-based coatings were deposited on 12Kh18N10T and tungsten substrates by chemical vapour deposition (CVD) using reduction of tantalum bromide vapour by cadmium vapour at а temperature of 1023 К. The formation of β-Ta, diffuse layers of Ta-Fe as well as Fe2Ta-based Laves phase in the deposited coating layers has been analysed.