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Differences in the properties of fused silica and silicon dioxide films: results of the atomistic simulationстатья
Дата последнего поиска статьи во внешних источниках: 10 июня 2020 г.
- Авторы: Grigoriev F.V., Sulimov V.B., Tikhonravov A.V.
- Журнал: Journal of Physics: Conference Series
- Том: 1391
- Год издания: 2019
- Издательство: IOP Publishing
- Местоположение издательства: [Bristol, UK], England
- Первая страница: 012022
- DOI: 10.1088/1742-6596/1391/1/012022
- Аннотация: Abstract. The previously developed atomistic method of the thin film deposition simulation is used to study the differences of the structural and mechanical properties of silicon dioxide thin films and fused silica. It's found that the bulk modulus, Young modulus and Poisson’s ratio are higher for high-energy deposited film than for low-energy deposited film and fused silica. All calculated values are in accordance with experimental data. The excess of the high-energy deposited film density above density of low-energy deposited film and fused silica in discussed in terms of the radial distribution function and cumulative number function.
- Добавил в систему: Григорьев Федор Васильевич