Kinetics of the Reactions Involving CF2 and CF in a Pure Tetrafluoromethane Plasma: I. Production of CF2 and CF via Electron-Impact Dissociationстатья

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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.

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[1] Kinetics of the reactions involving cf2 and cf in a pure tetrafluoromethane plasma: I. production of cf2 and cf via electron-impact dissociation / V. V. Ivanov, K. S. Klopovskiy, D. V. Lopaev et al. // Plasma Physics Reports. — 2002. — Vol. 28, no. 3. — P. 229–242. The kinetics of the production and loss of CF2 and CF radicals in a glow discharge in pure CF4 is investigated by the laser-induced fluorescence method. The effective rate constants for electron-impact dissociation of CF4 molecules along the pathways toward CF2 and CF radicals are determined within a wide range of the reduced electric field (80–250 Td). It is shown that, along with the direct electron-impact dissociation of CF4, the radicals are also produced via the dissociation of the CxFy polymer fluorocarbon particles that form in the plasma. A detailed analysis of the kinetics of the radical production and loss in a modulated discharge made it possible to evaluate the contribution of the electron-impact dissociation of CF4 to the production of radicals and, consequently, to determine the dissociation rate constants kCF2 and k CF. A comparison of the obtained kCF2 and k CF values with the results of calculations by the Monte Carlo method and the literature data on the cross sections for electron-impact dissociation of CF4 molecules enabled the normalization of these cross sections in the threshold region and the construction of the model cross sections for the electron-impact dissociation of CF4 into neutral products. The calculated cross sections allow a satisfactory description of the experimental results throughout the entire range of E/N under study. A significant scatter (up to 100%) in the experimental data on kCF2 and k CF at low values of E/N is related to the considerable contribution of the CxFy polymer molecules (and, probably, CxF y + ions and fluorocarbon grains) to the production of CF2 and CF radicals both in the plasma volume and on the surface of a fluorocarbon film covering the discharge tube wall. [ DOI ]

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