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Influence of Small-Size Contaminations on Thin Film Structural Propertiesстатья
Информация о цитировании статьи получена из
Web of Science,
Scopus
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 29 мая 2019 г.
- Авторы: Grigoriev F.V., Sulimov V.B., Jinlong Zhang, Xinbin Cheng, Zhanshan Wang, Tikhonravov A.V.
- Журнал: Chinese Physics Letters
- Том: 36
- Номер: 3
- Год издания: 2019
- Издательство: IOP Publishing
- Местоположение издательства: [Bristol, UK], England
- Первая страница: 038101
- DOI: 10.1088/0256-307x/36/3/038101
- Аннотация: Abstract An approach for studying the influence of nano-particles on the structural properties of deposited thin films is proposed. It is based on the molecular dynamic modeling of the deposition process in the presence of contaminating nano-particles. The nano-particle is assumed to be immobile and its interaction with film atoms is described by a spherically symmetric potential. The approach is applied to the investigation of properties of silicon dioxide films. Visualization tools are used to investigate the porosity associated with nano-particles. The structure of the film near the nano-particle is studied using the radial distribution function. It is found that fluctuations of film density near the nano-particles are essentially different in the cases of low-energy and high-energy deposition processes.
- Добавил в систему: Григорьев Федор Васильевич