Effect of space charge limited current on performance of organic field-effect transistorsстатья Исследовательская статья

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Дата последнего поиска статьи во внешних источниках: 18 января 2019 г.

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[1] Trukhanov V. A., Bruevich V. V., Paraschuk D. Y. Effect of space charge limited current on performance of organic field-effect transistors // Synthetic Metals. — 2018. — Vol. 246. — P. 254–259. The crucial parameter that determines the performance of a semiconductor material in organic field-effect transistors (OFETs) is the charge carrier mobility. The conventional method of its determination based on Shockley’s equations can lead to incorrect mobility evaluation due to contact effects. Particularly, in the common staggered OFET architecture (top-contact bottom-gate or bottom-contact top-gate), the space-charge limited current (SCLC) effect in the active layer under/above the source and drain contacts decreases the source-drain current. In this work, we model the effect of SCLC under/above the source and drain electrodes on the OFET apparent mobility (i.e., calculated from the device characteristics) and apparent threshold voltage for different active layer thickness and intrinsic mobility anisotropy. For the saturation regime, we derived simple analytical expressions for transfer characteristics and apparent mobility. Our modeling shows that the apparent OFET mobility is more than five times lower than the intrinsic one for the active layer thicker than 100 nm with mobility anisotropy (along vs across the active layer) higher than 100. While the SCLC effect does not change the apparent threshold voltage, it reveals itself as a kink at near zero voltage in the output characteristics. The proposed model gives analytical expressions for the transfer characteristics and apparent mobility as explicit functions of the intrinsic mobility and the device parameters in the saturation regime and as implicit functions in the linear regime. Our findings provide guidelines for accurate evaluation of the intrinsic mobility in OFETs fabricated in the staggered architecture and for further improvement of OFET performance. [ DOI ]

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