DIFFUSION IN THIN-FILM AMORPHOUS METALLIC ALLOYSстатья

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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.

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[1] Diffusion in thin-film amorphous metallic alloys / J. Bottiger, N. G. Chechenin, N. Karpe, J. P. Krog // Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. — 1994. — Vol. 85, no. 1-4. — P. 206–215. Due to their potential technological value and the interest from a basic scientific point of view, amorphous metallic alloys have been studied extensively in recent years. This includes investigations of atomic transport processes which play a key role for understanding, for example, crystallization processes and the solid-state amorphization reaction. The first measurements of diffusion in amorphous alloys were carried out about two decades ago, being difficult because of crystallization yielding very narrow temperature and time intervals in which the measurements can be carried out. Such measurements have been made possible only with the development of ion beam analysis and sputter sectioning techniques. A short summary of the experimental diffusion studies, mainly based on ion beam analysis, is given together with various theoretical models. These are based on defect-mediated diffusion and collective motion of many atoms. Nonconventional diffusion behavior caused, e.g., by buildup of stress during thermal annealing, relevant for solid-state amorphization reactions, will be discussed, and studies of the thermodynamic factor will be addressed.

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