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Constraint approaches for some inverse lithography problems with pixel-based maskстатья
Информация о цитировании статьи получена из
Scopus
Дата последнего поиска статьи во внешних источниках: 3 ноября 2018 г.
- Авторы: Kobelkov Sergey G., Tritchkov Alexander, Roizen Victoria, Han JiWan, Rodin Sergei, Granik Yuri
- Сборник: Optical Microlithography XXXI
- Год издания: 2018
- Место издания: SPIE
- Первая страница: 1
- Последняя страница: 7
- DOI: 10.1117/12.2297262
- Аннотация: Paper Abstract An approach of solving the inverse lithography problem as a nonlinear, constrained minimization problem over a domain of mask pixels was suggested in the paper by Yu. Granik "Fast pixel-based mask optimization for inverse lithography'' in 2006. This idea was advanced to account for pinching and bridging print contour constraints in the paper "Controlling Bridging and Pinching with Pixel-based Mask for Inverse Lithograph'' by S. Kobelkov and others in 2015. The present paper extends this approach further for solving the enclosure print image constraints, getting maximum common depth of focus, and obtaining uniform PV-bands. Namely, we suggest several objective functions that express penalty for constraint violations. Their minimization with gradient descent methods is considered. A number of applications have been tested with ILTbased pxOPC tool for DUV metal, contacts, and EUV metal layouts; results are discussed showing benefits of each approach.
- Добавил в систему: Кобельков Сергей Георгиевич