Effect of Residual Gas Pressure on Field Electron Emission from Nanographite Filmsстатья

Информация о цитировании статьи получена из Scopus, Web of Science
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.

Работа с статьей

[1] Vasilyeva E. A., Kleshch V. I., Obrazsov A. N. Effect of residual gas pressure on field electron emission from nanographite films // Journal of Nanoelectronics and Optoelectronics. — 2012. — Vol. 7, no. 1. — P. 41–45. Dependence of field electron emission properties of nanographite films on the pressure of the gas environment has been studied. The film cathodes were obtained by plasma enhanced chemical vapor deposition method. An efficient and stable emission from the films has been observed in a residual gas at pressures less than of 10(-5) Torr. The field characteristics measured at higher pressures demonstrated gradual degradation with time. The degraded field emission characteristics were partially recovered after subsequent pumping out to the original pressure of 10(-5) Torr. The experimental observations have shown that there are the two mechanisms of the residual gas pressure effect related to the cathode material destruction by ion bombardment and adsorption/desorption processes at the surface of the nanographite films during field emission measurements. [ DOI ]

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