ИСТИНА

Проект ставит своими целями экспериментальное и теоретическое изучение неравновесной плазмы ВЧ разряда низкого давления, в том числе при наличии внешнего магнитного поля, волн и полей, возбуждаемых в плазме системой не только токов, но и зарядов, механизмов поглощения высокочастотной мощности; нахождение комплексных импедансов разрядов с учетом наличия устройств, используемых для создания и поддержания разряда; сочетание подходов к рассмотрению плазмы как среды с распределенными и сосредоточенными параметрами с целью создания источников плазмы с управляемыми параметрами.

At present, plasma sources based on modifications of a radio-frequency (RF) discharge and their combination with a direct current discharge are widely used in ground-based and space technologies. The ever-growing demands of technology pose a challenge for researchers and engineers to develop new and improve known devices. In this regard, the questions of finding the key external factors that make it possible to control both the internal parameters of the discharge and the characteristics of technological processes are relevant. Currently, a huge number of literary sources are known, where the above problems are solved to one degree or another theoretically and / or experimentally. However, a review of the literature shows that the properties of RF discharge modifications are, as a rule, studied separately, without taking into account the external discharge circuit. In addition, the RF power input unit, as a rule, is represented as an idealized lumped element that creates either a system of charges or a system of currents on the surface of a plasma source. Both of these facts are significant shortcomings of the work performed earlier. Indeed, being a part of the technological unit, the plasma source becomes an element of the electric circuit, which includes the power source, active and reactive elements of the RF power input unit, distributed on the surface of the plasma source. To achieve the required results of technological processes, it is necessary to match the characteristics of the external circuit with the parameters of the plasma source. To achieve the required results of technological processes, it is necessary to match the characteristics of the external circuit with the parameters of the plasma source. When considering electrical circuits, plasma is presented as a lumped electrical element, fully characterized by its complex impedance. At the same time, the properties of the plasma, its parameters can be determined only from the solution of the electrodynamic problem in the language of waves and fields. Obviously, when solving electrodynamic problems, the plasma is represented as a distributed system. The project aims at the experimental and theoretical study of non-equilibrium plasma of a low-pressure high-frequency discharge, including in the presence of an external magnetic field, waves and fields excited in the plasma by a system of not only currents but also charges, mechanisms of absorption of radiofrequency power; finding complex impedances of discharges, taking into account the presence of devices used to create and maintain a discharge; a combination of approaches to treating plasma as a medium with distributed and lumped parameters in order to create plasma sources with controlled parameters.