ИСТИНА

Invention is related to measurements of radicals in research of photochemical and plasmachemical processes in laser systems, and also in manufacture of plasmachemical reactors in technology of semi-conductor instruments making in micro- and nano-electronics. Method consists in the fact that at gas flow at the outlet of discharge gap, which generates disintegrating plasma with chemically active particles (radicals), additional high-frequency discharge is applied, into which energy is put that does not exceed 5% of energy put into the main discharge.; Actinometry method is used to measure concentration of radicals in the main charge and in additional discharge in specified area of gas flow, then concentration of radicals is measured only in additional discharge with unavailability of the main discharge, and difference of two measurements in additional discharge is used to define concentration of radicals generated by the main discharge, in specified area of gas flow under condition of plasma decomposition and radicals destruction. EFFECT: Possibility to measure concentration of radicals at the outlet of discharge gap in specified area of gas flow in decomposed plasma