ИСТИНА

The carbon nanowall (CNW) film is a material composed of a dense array of micron-size flakes with layered graphite-like structure and dominating vertical orientation and chaotic lateral displacement with hundreds of nm mean spacing. Thickness of each flake may vary from several graphene layers to tens of nanometers which is the reason for term nanowall. The most widely used method for the CNW film fabrication is plasma enhanced chemical vapour deposition with different ways of plasma activation. The present work is aimed at an overview of general aspects of catalyst-free nucleation and growth of CNWs on silicon substrates in the plasma of dc glow discharge. Also different applications of the CNW films are considered. The work may be divided of the following sections. Thus evolution of the CNW structure during its growth is considered in the first section. Second section is devoted to both results of plasma calculation and phenomenological model of the CNW nucleation and growth. Application of the CNW films as electron field emitter, catalyst support, light absorber, an electrode material in supercapacitors and Li-ion batteries is considered in the third section. This work was financially supported by grant MK-2773.2014.2.