ИСТИНА

We propose a scheme of maskless holography as a base of a novel lithographic technic. Maskless schemes based on reflective SLMs with planar and non-planar layouts are considered. Several effective methods of phase hologram synthesis adapted to the layouts are also introduced. These methods are based on the holographic lithography approach and calculation algorithms that have been developed by Nanotech SWHL. The aim of the work is to find the proper scheme and SLM characteristics, e.g. micromirror size, flatness, dynamic stability, etc. The non-flat optical schemes based on array of reflective SLMs will allow to achieve high NA up to 0.9 without immersion. That investigation allows to design a photolithographic tool with high diffraction efficiency and high-end capabilities.