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Интеллектуальная Система Тематического Исследования НАукометрических данных |
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The aim of the presented work is to determine basic parameters related to material degradation under plasma treatment such as vacancy formation energy, threshold displacement energy, surface binding energy, etc. These parameters will be used in our 3D Monte–Carlo model to simulate changes in nanoporous SiOCH materials caused by ion-stimulated plasma etching.