ИСТИНА

We present results of investigations directed on revealing of effect of the key process parameters on uniformity of coatings obtained by a chemical vapor deposition (CVD) techniques exploring a plasma enhancement with DC-discharge, plasma jet, and hot filament activation methods. The coating materials were crystalline nanostructures, including diamond- and graphite-like nanocarbons. In particular, the shapes (regular tetragon, rectangle, and circle) of silicon substrates, the configurations of the electrodes (for DC PECVD), nozzles (for plasma jet CVD), filaments (for HF CVD) were simulated to find the most appropriate conditions for obtaining the uniform coatings