ИСТИНА

• Охват: Международная
• Даты проведения: 18-21 июня 2018
• Место проведения: Kazimierz Dolny, Poland
• Организаторы:
  Maria Curie-Skłodowska University
  Lublin University of Technology
  Wrocław University of Technology
• Число участников: 200
• Веб-сайт: http://ion.umcs.lublin.pl/
• Описание конференции:

  The ION 2018 Conference will continue to present state-of-the-art ion, electron and plasma science and technology and its application in materials engineering. It has to be noted particularly that this now well-established series of biennial ION conferences has created a unique opportunity for scientists from Eastern and Western Europe together with their Polish colleagues, to discuss in a most agreeable environment, some of the fundamental questions in their field and develop new perspectives through the mutual exchange of ideas. The following topics represent the focus of the ION 2018: – formation and modification of subsurface layers using ion, electron and plasma electron technologies, – ion beam micro- and nano-engineering, – plasma – based and ion beam – assisted deposition method, – research methods with application of ions and electrons, – fundamentals of ion beam interactions with solids. The range of materials includes metals, semiconductors, insulators, polymers, etc.

• Добавил в систему: Лагов Петр Борисович

Доклады:

• 2018 High-rate high-density ICP etching of germanium (Стендовый)
• Авторы: Lagov P.B., Maslovsky V.M., Pavlov Yu S., Lednev A.M., Drenin A.S., Skryleva E.A., Rogovsky E.S.

• 2018 Lifetime control of silicon devices by proton and carbon implantation (Стендовый)
• Авторы: Lagov P.B., Kulevoi T.V., Volkov A.N., Andreev D.V., Maslovsky V.M.