Comparison of image characteristics projection photolithographyстатья
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Дата последнего поиска статьи во внешних источниках: 28 мая 2015 г.
Аннотация:The characteristics of images formed by some typical photomasks have been compared using
numerical simulation. The technique for estimating the critical dimensions of image elements has been considered. The dependences of the critical dimensions on the numerical aperture and coherence parameter for a light source with a circular aperture and for different types of photomasks have been analyzed.