Spatially Resolved In Situ Diagnostics for Plasma-Enhanced Chemical Vapor Deposition Carbon Film Growthстатья
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Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Аннотация:In this paper we present the results of optical emission spectroscopy study of a plasma enhanced
chemical vapor deposition of carbon films. The materials produced in this study were the diamond
films, containing the pyramidal diamond crystallites, and the films, consisting of multi-wall carbon
nanotubes. These carbon films were deposited from a hydrogen and methane gas mixture activated
by a direct current discharge. The optical emission spectra were recorded for different areas of the
discharge plasma to provide a spatial mapping the gas-phase species concentrations and electron
temperatures. The obtained results are used for optimization of the deposition process and for
developing the mechanisms explaining formation of the carbon materials with different properties.