Thin graphite films formation by carbon precipitation in metals: diffusion approachстатья
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Web of Science
Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 26 августа 2016 г.
Аннотация:Thin graphite films attract significant interest due to their unique physical properties
and potential applications. Chemical vapor deposition in the presence of metal catalysts is one of
the most promising and widely used techniques to produce these films. There are many experimental
works devoted to the material synthesis; however, the results are usually obtained by the
trial-and-error method without a proper understanding of the processes behind the experiment.
We theoretically analyze the carbon diffusion processes inside a metal substrate during the deposition.
The theory allows interconnection of the deposition parameters with the thickness of
produced graphite films. Numerically solving the diffusion equations for the real systems,
we obtained a good correlation between simulations and experimental data. Based on our simulations,
we made some conclusions about the formation of graphite films by the precipitation
process. The numerical simulations were mostly done for the popular nickel substrates, but we
also made some calculations for iron, showing that it also could be used to form thin graphite
films under certain conditions.