On the polarization-sensitive four-wave mixing as a method for in situ morphology diagnostics of nanocrystal materialsстатья
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Статья опубликована в журнале из списка Web of Science и/или Scopus
Дата последнего поиска статьи во внешних источниках: 18 июля 2013 г.
Местоположение издательства:[Bristol, UK], England
Первая страница:1292
Последняя страница:1297
Аннотация:Nonlinear-optical processes are shown to be sensitive to changes in the point-group symmetry of materials caused by nanostructuring. The properties of the cubic susceptibility tensor responsible for the four-wave mixing process are examined in the case of nanoporous silicon, which is considered as an example of a nanocrystal material with a modified point-group symmetry. This analysis demonstrates that polarization-sensitive four-wave mixing can be employed for in situ morphology diagnostics of materials during nanostructuring and nanofabrication.